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Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

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https://hal-utt.archives-ouvertes.fr/hal-02290546
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Tuesday, September 17, 2019 - 5:11:52 PM
Last modification on : Friday, July 17, 2020 - 2:56:58 PM

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Linda Aissani, Akram Alhussein, Corinne Nouveau, Laala Ghelani, Mourad Zaabat. Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings. Surface and Coatings Technology, Elsevier, 2019, 378, pp.124948. ⟨10.1016/j.surfcoat.2019.124948⟩. ⟨hal-02290546⟩

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