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Journal articles
Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings
Mourad Zaabat 2
Author
1
Universite Abbes Laghrour [Khenchela] (BP 1252 Route de Batna Khenchela -40004 - Algeria)
2
University of Larbi Ben M'hidi (France)
3
LASMIS - Laboratoire des Systèmes Mécaniques et d'Ingénierie Simultanée (12 rue Marie Curie - BP 2060 10010 TROYES CEDEX - France)
- ICD - Institut Charles Delaunay (12, rue Marie Curie BP 2060 - 10010 Troyes Cedex - France)
- CNRS - Centre National de la Recherche Scientifique : UMR6281 (France)
- UTT - Université de Technologie de Troyes (12 rue Marie Curie CS 42060 10004 TROYES CEDEX - France)
4
LABOMAP - Laboratoire Bourguignon des Matériaux et Procédés (F-71250 Cluny - France)
- Arts et Métiers Sciences et Technologies (151 boulevard de l'Hôpital 75013 Paris - France)
- HESAM - HESAM Université (15, rue Soufflot 75005 Paris - France)
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Journal articles
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https://hal-utt.archives-ouvertes.fr/hal-02290546
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Tuesday, September 17, 2019 - 5:11:52 PM
Last modification on : Friday, July 17, 2020 - 2:56:58 PM
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Tuesday, September 17, 2019 - 5:11:52 PM
Last modification on : Friday, July 17, 2020 - 2:56:58 PM
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- HAL Id : hal-02290546, version 1
- DOI : 10.1016/j.surfcoat.2019.124948
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Citation
Linda Aissani, Akram Alhussein, Corinne Nouveau, Laala Ghelani, Mourad Zaabat. Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings. Surface and Coatings Technology, Elsevier, 2019, 378, pp.124948. ⟨10.1016/j.surfcoat.2019.124948⟩. ⟨hal-02290546⟩
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