Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings - Archive ouverte HAL Access content directly
Journal Articles Surface and Coatings Technology Year : 2019

Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

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hal-02290546 , version 1 (20-07-2022)

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Attribution - NonCommercial - CC BY 4.0

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Linda Aissani, Akram Alhussein, Corinne Nouveau, Laala Ghelani, Mourad Zaabat. Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings. Surface and Coatings Technology, 2019, 378, pp.124948. ⟨10.1016/j.surfcoat.2019.124948⟩. ⟨hal-02290546⟩
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