Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

Linda Aissani (1, 2) , Akram Alhussein (3) , Corinne Nouveau (4) , Laala Ghelani (1) , Mourad Zaabat (2)

1 Universite Abbes Laghrour [Khenchela]
2 University of Larbi Ben M'hidi
3 LASMIS - Laboratoire des Systèmes Mécaniques et d'Ingénierie Simultanée
4 LABOMAP - Laboratoire Bourguignon des Matériaux et Procédés

Domaines: Physique des plasmas [physics.plasm-ph]; Mécanique des matériaux [physics.class-ph]

Linda Aissani, Akram Alhussein, Corinne Nouveau, Laala Ghelani, Mourad Zaabat. Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings. Surface and Coatings Technology, 2019, 378, pp.124948. ⟨10.1016/j.surfcoat.2019.124948⟩. ⟨hal-02290546⟩