New Al-Ti-W metallic glass thin film deposited by co-sputtering system: Microstructure analysis and corrosion resistance - Université de technologie de Troyes Accéder directement au contenu
Communication Dans Un Congrès Année : 2021

New Al-Ti-W metallic glass thin film deposited by co-sputtering system: Microstructure analysis and corrosion resistance

Fichier non déposé

Dates et versions

hal-03565520 , version 1 (11-02-2022)

Identifiants

  • HAL Id : hal-03565520 , version 1

Citer

Issam Lakdhar, Akram Alhussein, Juan Creus. New Al-Ti-W metallic glass thin film deposited by co-sputtering system: Microstructure analysis and corrosion resistance. International Conference on Chemistry Materials and Environment, Dec 2021, Sousse, Tunisia. ⟨hal-03565520⟩

Collections

UTT
20 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More