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New Al-Ti-W metallic glass thin film deposited by co-sputtering system: Microstructure analysis and corrosion resistance

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https://hal-utt.archives-ouvertes.fr/hal-03565520
Contributor : Akram Alhussein Connect in order to contact the contributor
Submitted on : Friday, February 11, 2022 - 8:41:12 AM
Last modification on : Sunday, June 26, 2022 - 9:32:53 AM

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  • HAL Id : hal-03565520, version 1

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Issam Lakdhar, Akram Alhussein, Juan Creus. New Al-Ti-W metallic glass thin film deposited by co-sputtering system: Microstructure analysis and corrosion resistance. International Conference on Chemistry Materials and Environment, Dec 2021, Sousse, Tunisia. ⟨hal-03565520⟩

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