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New Al-Ti-W metallic glass thin film deposited by co-sputtering system: Microstructure analysis and corrosion resistance

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hal-03565520 , version 1 (11-02-2022)

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  • HAL Id : hal-03565520 , version 1

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Issam Lakdhar, Akram Alhussein, Juan Creus. New Al-Ti-W metallic glass thin film deposited by co-sputtering system: Microstructure analysis and corrosion resistance. International Conference on Chemistry Materials and Environment, Dec 2021, Sousse, Tunisia. ⟨hal-03565520⟩

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