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Effect of vacuum annealing on the structural and optical properties of sputtered Cu4O3 thin films

L. Radjehi 1 L. Aissani 2 A. Djelloul 3 Salim Lamri 4 Komla Nomenyo 5 Sofiane Achache 4 Gilles Lerondel 5 Frédéric Sanchette 4 
1 LASPI2A - Laboratoire des structures, propriétés et interactions inter atomiques
2 Laboratory of Active Components and Materials
3 LASPI2A - Laboratoire des structures, propriétés et interactions inter atomique
4 LASMIS - Laboratoire des Systèmes Mécaniques et d'Ingénierie Simultanée
ICD - Institut Charles Delaunay
5 L2n - Lumière, nanomatériaux et nanotechnologies
ICD - Institut Charles Delaunay
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https://hal-utt.archives-ouvertes.fr/hal-03158403
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Submitted on : Wednesday, March 3, 2021 - 6:33:30 PM
Last modification on : Sunday, June 26, 2022 - 4:49:36 AM

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L. Radjehi, L. Aissani, A. Djelloul, Salim Lamri, Komla Nomenyo, et al.. Effect of vacuum annealing on the structural and optical properties of sputtered Cu4O3 thin films. Surface Engineering, Maney Publishing, 2020, pp.1-7. ⟨10.1080/02670844.2020.1753397⟩. ⟨hal-03158403⟩

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