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Journal articles
Facile, wafer-scale compatible growth of ZnO nanowires via chemical bath deposition: assessment of zinc ion contribution and other limiting factors
Yu-Chen Huang
Junze Zhou
1
Komla Nomenyo
1
Rodica Elena Ionescu
1
Anisha Gokarna
1
Gilles Lerondel
1
Anisha Gokarna 1
Author
Gilles Lerondel 1
Author IdHAL : gilles-lerondel
1
L2n - Lumière, nanomatériaux et nanotechnologies (France)
- ICD - Institut Charles Delaunay (12, rue Marie Curie BP 2060 - 10010 Troyes Cedex - France)
- UTT - Université de Technologie de Troyes (12 rue Marie Curie CS 42060 10004 TROYES CEDEX - France)
- CNRS - Centre National de la Recherche Scientifique : UMR6281 (France)
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Journal articles
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https://hal-utt.archives-ouvertes.fr/hal-03158377
Contributor : Gilles Lerondel Connect in order to contact the contributor
Submitted on : Wednesday, March 3, 2021 - 6:11:14 PM
Last modification on : Wednesday, September 15, 2021 - 3:03:44 PM
Contributor : Gilles Lerondel Connect in order to contact the contributor
Submitted on : Wednesday, March 3, 2021 - 6:11:14 PM
Last modification on : Wednesday, September 15, 2021 - 3:03:44 PM
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- HAL Id : hal-03158377, version 1
- DOI : 10.1039/d0na00434k
Citation
Yu-Chen Huang, Junze Zhou, Komla Nomenyo, Rodica Elena Ionescu, Anisha Gokarna, et al.. Facile, wafer-scale compatible growth of ZnO nanowires via chemical bath deposition: assessment of zinc ion contribution and other limiting factors. Nanoscale Advances, RSC, 2020, 2 (11), pp.5288-5295. ⟨10.1039/d0na00434k⟩. ⟨hal-03158377⟩
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