Patents
Year : 2016
Jean-Baptiste VU VAN : Connect in order to contact the contributor
https://hal-utt.archives-ouvertes.fr/hal-03141938
Submitted on : Monday, February 15, 2021-4:07:55 PM
Last modification on : Friday, March 24, 2023-2:53:20 PM
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- HAL Id : hal-03141938 , version 1
Cite
Gilles Lerondel, Laurent Divay. Method of making film or wafer composed of material of metal oxide type or semiconductor type to have nanostructure. Japan, Patent n° : JP6014722 (B2). 2016. ⟨hal-03141938⟩
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