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Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type

Gilles Lerondel 1 Laurent Divay 
1 LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique
ICD - Institut Charles Delaunay
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https://hal-utt.archives-ouvertes.fr/hal-03141933
Contributor : Jean-Baptiste VU VAN Connect in order to contact the contributor
Submitted on : Monday, February 15, 2021 - 4:06:09 PM
Last modification on : Sunday, June 26, 2022 - 4:46:51 AM

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  • HAL Id : hal-03141933, version 1

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Gilles Lerondel, Laurent Divay. Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type. United States, Patent n° : US2012133029 (A1). 2012. ⟨hal-03141933⟩

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