Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type - Université de technologie de Troyes Access content directly
Patents Year : 2012

Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type

Gilles Lerondel
Laboratoire de Nanotechnologie et d'Instrumentation Optique
CV
Laurent Divay
  • Function : Author

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Optics / Photonic

Jean-Baptiste VU VAN  : Connect in order to contact the contributor

https://hal-utt.archives-ouvertes.fr/hal-03141931

Submitted on : Monday, February 15, 2021-4:05:10 PM

Last modification on : Friday, March 24, 2023-2:53:20 PM

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hal-03141931 , version 1 (15-02-2021)

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  • HAL Id : hal-03141931 , version 1

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Gilles Lerondel, Laurent Divay. Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type. China, Patent n° : CN102428215 (A). 2012. ⟨hal-03141931⟩

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