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Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering

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hal-02870949 , version 1 (17-06-2020)

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  • HAL Id : hal-02870949 , version 1

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Lamia Radjehi, Salim Lamri, Abdelkader Djelloul, Frédéric Sanchette. Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering. 15th International Conference on Plasma Surface Engineering, Sep 2016, Garmisch-Partenkirchen, Germany. ⟨hal-02870949⟩
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