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Poster communications

Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering

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Poster communications
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https://hal-utt.archives-ouvertes.fr/hal-02870949
Contributor : Jean-Baptiste Vu Van Connect in order to contact the contributor
Submitted on : Wednesday, June 17, 2020 - 7:43:19 AM
Last modification on : Wednesday, September 15, 2021 - 3:09:17 PM

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  • HAL Id : hal-02870949, version 1

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Lamia Radjehi, Salim Lamri, Abdelkader Djelloul, Frédéric Sanchette. Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering. 15th International Conference on Plasma Surface Engineering, Sep 2016, Garmisch-Partenkirchen, Germany. ⟨hal-02870949⟩

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