Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering

Lamia Radjehi; Salim Lamri; Abdelkader Djelloul; Frédéric Sanchette

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Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering

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Lamia Radjehi

Function : Author

Universite Abbes Laghrour [Khenchela]

Salim Lamri

Function : Author
PersonId : 905280

Laboratoire LERMPS

Abdelkader Djelloul

Function : Author

Frédéric Sanchette

Function : Author
PersonId : 784396
ORCID : 0000-0002-4665-1891
IdRef : 177130067

Laboratoire des Systèmes Mécaniques et d'Ingénierie Simultanée

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Engineering Sciences [physics]

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https://hal-utt.archives-ouvertes.fr/hal-02870949

Submitted on : Wednesday, June 17, 2020-7:43:19 AM

Last modification on : Friday, March 24, 2023-2:53:17 PM

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hal-02870949 , version 1 (17-06-2020)

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HAL Id : hal-02870949 , version 1

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Lamia Radjehi, Salim Lamri, Abdelkader Djelloul, Frédéric Sanchette. Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering. 15th International Conference on Plasma Surface Engineering, Sep 2016, Garmisch-Partenkirchen, Germany. ⟨hal-02870949⟩

Electrical and Structural properties of Cu2O thin films deposited at different temperatures by magnetron sputtering

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