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Large scale sub-100 nm 2D nanostructuring obtained by nanosphere lithography combined with metal evaporation and reactive ion etching

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https://hal-utt.archives-ouvertes.fr/hal-02866321
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Friday, June 12, 2020 - 1:32:47 PM
Last modification on : Wednesday, September 23, 2020 - 4:33:12 AM

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  • HAL Id : hal-02866321, version 1

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Hind Kadiri, Marco Faustini, Daniel Turover, David Grosso, Gilles Lerondel. Large scale sub-100 nm 2D nanostructuring obtained by nanosphere lithography combined with metal evaporation and reactive ion etching. JNTE215 4èmes Journées Nationales sur les Technologies Emergentes en micro-nanofabrication, Nov 2015, Ecully, France. ⟨hal-02866321⟩

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