Large scale sub-100 nm 2D nanostructuring obtained by nanosphere lithography combined with metal evaporation and reactive ion etching - Archive ouverte HAL Access content directly
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Large scale sub-100 nm 2D nanostructuring obtained by nanosphere lithography combined with metal evaporation and reactive ion etching

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hal-02866321 , version 1 (12-06-2020)

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  • HAL Id : hal-02866321 , version 1

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Hind Kadiri, Marco Faustini, Daniel Turover, David Grosso, Gilles Lerondel. Large scale sub-100 nm 2D nanostructuring obtained by nanosphere lithography combined with metal evaporation and reactive ion etching. JNTE215 4èmes Journées Nationales sur les Technologies Emergentes en micro-nanofabrication, Nov 2015, Ecully, France. ⟨hal-02866321⟩
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