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Advanced large scale colloidal lithography for sub-100 nm direct and indirect structuring: application to silicon and metals

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Optics / Photonic

Jean-Baptiste VU VAN  : Connect in order to contact the contributor

https://hal-utt.archives-ouvertes.fr/hal-02866188

Submitted on : Friday, June 12, 2020-12:20:44 PM

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hal-02866188 , version 1 (12-06-2020)

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  • HAL Id : hal-02866188 , version 1

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Hind Kadiri, Marco Faustini, Daniel Turover, David Grosso, Anisha Gokarna, et al.. Advanced large scale colloidal lithography for sub-100 nm direct and indirect structuring: application to silicon and metals. Tech connect World Innovation Conference & Expo, Jun 2015, Washington, United States. ⟨hal-02866188⟩

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