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Advanced large scale colloidal lithography for sub-100 nm direct and indirect structuring: application to silicon and metals

Hind Kadiri 1 Marco Faustini 2 Daniel Turover 3 David Grosso 4 Anisha Gokarna 1 Gilles Lerondel 1 
1 LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique
ICD - Institut Charles Delaunay
2 LCMCP-MHN - Matériaux Hybrides et Nanomatériaux
3 SILSEF SAS
4 MHN - Matériaux Hybrides et Nanomatériaux
LCMCP - Laboratoire de Chimie de la Matière Condensée de Paris
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Conference papers
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https://hal-utt.archives-ouvertes.fr/hal-02866188
Contributor : Jean-Baptiste VU VAN Connect in order to contact the contributor
Submitted on : Friday, June 12, 2020 - 12:20:44 PM
Last modification on : Sunday, June 26, 2022 - 4:46:30 AM

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  • HAL Id : hal-02866188, version 1

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UPMC | CNRS | CDF | LCMCP | INC-CNRS | LCMCP-MHN | PSL | SORBONNE-UNIVERSITE | SU-SCIENCES | UTT

Citation

Hind Kadiri, Marco Faustini, Daniel Turover, David Grosso, Anisha Gokarna, et al.. Advanced large scale colloidal lithography for sub-100 nm direct and indirect structuring: application to silicon and metals. Tech connect World Innovation Conference & Expo, Jun 2015, Washington, United States. ⟨hal-02866188⟩

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