Method of nanostructring a film or a wafer of material of the metal oxide or semi-conductor type - Archive ouverte HAL Access content directly
Patents Year : 2010

Method of nanostructring a film or a wafer of material of the metal oxide or semi-conductor type

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hal-02866038 , version 1 (12-06-2020)

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  • HAL Id : hal-02866038 , version 1

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Gilles Lerondel, Laurent Divay. Method of nanostructring a film or a wafer of material of the metal oxide or semi-conductor type. Unknown Region, Patent n° : WO2010130963 (A1). 2010. ⟨hal-02866038⟩

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