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Method of nanostructring a film or a wafer of material of the metal oxide or semi-conductor type

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https://hal-utt.archives-ouvertes.fr/hal-02866038
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Friday, June 12, 2020 - 11:13:06 AM
Last modification on : Saturday, June 13, 2020 - 3:37:16 AM

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  • HAL Id : hal-02866038, version 1

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Citation

Gilles Lerondel, Laurent Divay. Method of nanostructring a film or a wafer of material of the metal oxide or semi-conductor type. Unknown Region, Patent n° : WO2010130963. 2010. ⟨hal-02866038⟩

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