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Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type

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https://hal-utt.archives-ouvertes.fr/hal-02866026
Contributor : Jean-Baptiste Vu Van Connect in order to contact the contributor
Submitted on : Friday, June 12, 2020 - 11:07:39 AM
Last modification on : Wednesday, September 15, 2021 - 3:03:56 PM

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  • HAL Id : hal-02866026, version 1

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UTT | CNRS

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Gilles Lerondel, Laurent Divay. Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type. Unknown Region, Patent n° : EP2430220 (A1). 2012. ⟨hal-02866026⟩

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