Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type - Université de technologie de Troyes Access content directly
Patents Year : 2012

Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type

Gilles Lerondel
Laboratoire de Nanotechnologie et d'Instrumentation Optique
CV
Laurent Divay
  • Function : Author

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Optics / Photonic

Jean-Baptiste VU VAN  : Connect in order to contact the contributor

https://hal-utt.archives-ouvertes.fr/hal-02866026

Submitted on : Friday, June 12, 2020-11:07:39 AM

Last modification on : Friday, March 24, 2023-2:53:17 PM

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hal-02866026 , version 1 (12-06-2020)

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  • HAL Id : hal-02866026 , version 1

Cite

Gilles Lerondel, Laurent Divay. Method of nanostructuring a film or a wafer of material of the metal oxide or semiconductor type. Unknown Region, Patent n° : EP2430220 (A1). 2012. ⟨hal-02866026⟩

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