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Method for integrating two-dimensional materials on a nanostructured substrate, suspended thin film of two-dimensional materials and uses there of

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https://hal-utt.archives-ouvertes.fr/hal-02866007
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Friday, June 12, 2020 - 11:00:16 AM
Last modification on : Saturday, June 13, 2020 - 3:37:16 AM

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  • HAL Id : hal-02866007, version 1

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P2MN | UTT | CNRS

Citation

Gilles Lerondel, Hyun Jeong, Anisha Gokarna. Method for integrating two-dimensional materials on a nanostructured substrate, suspended thin film of two-dimensional materials and uses there of. Unknown Region, Patent n° : WO2018116048. 2018. ⟨hal-02866007⟩

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