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METHOD FOR INTEGRATING TWO-DIMENSIONAL MATERIALS ON A NANOSTRUCTURED SUBSTRATE, SUSPENDED THIN FILM OF TWO-DIMENSIONAL MATERIALS AND USES THEREOF

Abstract : A method of integrating two-dimensional materials onto a nanostructured substrate, characterised in that it comprises the following steps: manufacturing the two-dimensional materials by means of a vapour deposition or an exfoliation method; and transferring the two-dimensional materials obtained in the previous step onto a synthesised nanostructured substrate that is selected such that a contact surface between the two-dimensional materials and the nanostructured substrate is minimised. The invention further relates to fully suspended thin films obtained by the above method, and to the use of the suspended thin films in various fields such as electronics, optoelectronics, photovoltaics, catalysis, ultrasensitive surfaces, integrated circuits etc.
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Patents
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https://hal-utt.archives-ouvertes.fr/hal-02866000
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Friday, June 12, 2020 - 10:55:15 AM
Last modification on : Saturday, June 13, 2020 - 3:37:16 AM

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  • HAL Id : hal-02866000, version 1

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P2MN | UTT | CNRS

Citation

Gilles Lerondel, Hyun Jeong, Gokarna Anisha. METHOD FOR INTEGRATING TWO-DIMENSIONAL MATERIALS ON A NANOSTRUCTURED SUBSTRATE, SUSPENDED THIN FILM OF TWO-DIMENSIONAL MATERIALS AND USES THEREOF. France, Patent n° : WO/2018/116048. 2018. ⟨hal-02866000⟩

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