Fabrication and tuning of high quality porous silicon microcavities
Résumé
We have made a number of high quality porous silicon microcavities operating in the visible and near infrared regions with a FWHM of less than 2 nm. This is achieved through the low temperature anodic oxidation of highly doped p‐type silicon wafers. Reduced interface fluctuations and very large porosity modulations are responsible for the improvement of the quality of the optical structure. We have also demonstrated thermally induced, post‐fabrication tuning of the cavity resonance, which leads to non‐permanent and repeatable changes in the cavity mode.