Bi-objective Optimization of the Plasmon-assisted Lithography - Design of Plasmonic Nanostructures

Abstract : We discuss the influence of the objective function within the context of plasmons-assisted lithography. From previous publications, numerical experiments have shown that the maximization by means of an Evolutionary Strategy of either the visibility or the contrast of the plasmons interference pattern related to the problem does not lead to the ideal situation in which both criteria are maximal. The idea is then to tackle simultaneously these two objective-functions. However, as they are strongly dependent, a more promising strategy is to focus on the minimal and maximal near-field scattered intensities involved in both previously studied criteria. We think that an Evolutionary Strategy based on a bi-objective optimization of these new criteria will provide more satisfactory solutions with respect to the physical constraints imposed.