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Evolutionary Optimization for Plasmon-Assisted Lithography

Caroline Prodhon 1 Demetrio Macías 2 Farouk Yalaoui 1 Alexandre Vial 2 Lionel Amodeo 1 
1 LOSI - Laboratoire d'Optimisation des Systèmes Industriels
ICD - Institut Charles Delaunay
2 LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique
ICD - Institut Charles Delaunay
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Conference papers
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https://hal-utt.archives-ouvertes.fr/hal-02555974
Contributor : Jean-Baptiste VU VAN Connect in order to contact the contributor
Submitted on : Monday, April 27, 2020 - 5:07:34 PM
Last modification on : Sunday, June 26, 2022 - 4:46:00 AM

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Caroline Prodhon, Demetrio Macías, Farouk Yalaoui, Alexandre Vial, Lionel Amodeo. Evolutionary Optimization for Plasmon-Assisted Lithography. EvoWorkshops 2009, Apr 2009, Tübingen, Germany. Springer, ⟨10.1007/978-3-642-01129-0_47⟩. ⟨hal-02555974⟩

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