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New photopolymer material based on PMMA for Near field nano-lithography

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https://hal-utt.archives-ouvertes.fr/hal-02498919
Contributor : Jean-Baptiste VU VAN Connect in order to contact the contributor
Submitted on : Wednesday, March 4, 2020 - 6:41:35 PM
Last modification on : Sunday, June 26, 2022 - 4:45:32 AM

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  • HAL Id : hal-02498919, version 1

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CNRS | UTT

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Safi Jradi, Carlo Vincienzo Genuino Dajac, Xinhua Zeng, Jerome Plain, Renaud Bachelot, et al.. New photopolymer material based on PMMA for Near field nano-lithography. Frontiers in Polymer Science, Jun 2009, Mayence, Germany. ⟨hal-02498919⟩

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