Skip to Main content Skip to Navigation
Conference papers

New photopolymer material based on PMMA for Near field nano-lithography

Safi Jradi 1 Carlo Vincienzo Genuino Dajac Xinhua Zeng 1 Jerome Plain 1 Renaud Bachelot 1 Pascal Royer 1 
1 LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique
ICD - Institut Charles Delaunay
Document type :
Conference papers
Complete list of metadata
https://hal-utt.archives-ouvertes.fr/hal-02498919
Contributor : Jean-Baptiste VU VAN Connect in order to contact the contributor
Submitted on : Wednesday, March 4, 2020 - 6:41:35 PM
Last modification on : Sunday, June 26, 2022 - 4:45:32 AM

Identifiers

  • HAL Id : hal-02498919, version 1

Collections

CNRS | UTT

Citation

Safi Jradi, Carlo Vincienzo Genuino Dajac, Xinhua Zeng, Jerome Plain, Renaud Bachelot, et al.. New photopolymer material based on PMMA for Near field nano-lithography. Frontiers in Polymer Science, Jun 2009, Mayence, Germany. ⟨hal-02498919⟩

Export

BibTeX TEI DC DCterms EndNote Datacite

Share

Metrics

Record views

18