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https://hal-utt.archives-ouvertes.fr/hal-02498919
Submitted on : Wednesday, March 4, 2020-6:41:35 PM
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- HAL Id : hal-02498919 , version 1
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Safi Jradi, Carlo Vincienzo Genuino Dajac, Xinhua Zeng, Jerome Plain, Renaud Bachelot, et al.. New photopolymer material based on PMMA for Near field nano-lithography. Frontiers in Polymer Science, Jun 2009, Mayence, Germany. ⟨hal-02498919⟩
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