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Conference papers
New photopolymer material based on PMMA for Near field nano-lithography
Safi Jradi
1
Carlo Vincienzo Genuino Dajac
Xinhua Zeng
1
Jerome Plain
1
Renaud Bachelot
1
Pascal Royer
1
1
LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique
ICD - Institut Charles Delaunay
Safi Jradi 1
Author
Xinhua Zeng 1
Author
Jerome Plain 1
Author IdHAL : jerome-plain ResearcherId : http://www.researcherid.com/rid/jerome.plain@utt.fr ORCID : https://orcid.org/0000-0001-5806-9965
Renaud Bachelot 1
Author
Pascal Royer 1
Author
1
LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique (12 rue Marie Curie - BP 2060 10010 TROYES CEDEX - France)
- ICD - Institut Charles Delaunay (12, rue Marie Curie BP 2060 - 10010 Troyes Cedex - France)
- UTT - Université de Technologie de Troyes (12 rue Marie Curie CS 42060 10004 TROYES CEDEX - France)
- CNRS - Centre National de la Recherche Scientifique : UMR6281 (France)
Document type :
Conference papers
Domain :
Complete list of metadatas
https://hal-utt.archives-ouvertes.fr/hal-02498919
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Wednesday, March 4, 2020 - 6:41:35 PM
Last modification on : Wednesday, April 1, 2020 - 1:18:01 PM
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Wednesday, March 4, 2020 - 6:41:35 PM
Last modification on : Wednesday, April 1, 2020 - 1:18:01 PM
Identifiers
- HAL Id : hal-02498919, version 1
Citation
Safi Jradi, Carlo Vincienzo Genuino Dajac, Xinhua Zeng, Jerome Plain, Renaud Bachelot, et al.. New photopolymer material based on PMMA for Near field nano-lithography. Frontiers in Polymer Science, Jun 2009, Mayence, Germany. ⟨hal-02498919⟩
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