New photopolymer material based on PMMA for Near field nano-lithography - Archive ouverte HAL Access content directly
Conference Papers Year :

New photopolymer material based on PMMA for Near field nano-lithography

(1) , , (1) , (1) , (1) , (1)
1
Not file

Dates and versions

hal-02498919 , version 1 (04-03-2020)

Identifiers

  • HAL Id : hal-02498919 , version 1

Cite

Safi Jradi, Carlo Vincienzo Genuino Dajac, Xinhua Zeng, Jerome Plain, Renaud Bachelot, et al.. New photopolymer material based on PMMA for Near field nano-lithography. Frontiers in Polymer Science, Jun 2009, Mayence, Germany. ⟨hal-02498919⟩

Collections

CNRS UTT
19 View
0 Download

Share

Gmail Facebook Twitter LinkedIn More