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Conference papers
Quantum confinement tuning in porous silicon by local photo oxidation
Mathieu Juan
1
Jean-Sébastien Bouillard
1
Jerome Plain
1
Gilles Lerondel
1
Renaud Bachelot
1
Pascal Royer
1
1
LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique
ICD - Institut Charles Delaunay
Mathieu Juan 1
Author
Jean-Sébastien Bouillard 1
Author
Jerome Plain 1
Author IdHAL : jerome-plain ResearcherId : http://www.researcherid.com/rid/jerome.plain@utt.fr ORCID : https://orcid.org/0000-0001-5806-9965
Gilles Lerondel 1
Author IdHAL : gilles-lerondel
Renaud Bachelot 1
Author
Pascal Royer 1
Author
1
LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique (12 rue Marie Curie - BP 2060 10010 TROYES CEDEX - France)
- ICD - Institut Charles Delaunay (12, rue Marie Curie BP 2060 - 10010 Troyes Cedex - France)
- UTT - Université de Technologie de Troyes (12 rue Marie Curie CS 42060 10004 TROYES CEDEX - France)
- CNRS - Centre National de la Recherche Scientifique : UMR6281 (France)
Document type :
Conference papers
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Complete list of metadatas
https://hal-utt.archives-ouvertes.fr/hal-02495727
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Monday, March 2, 2020 - 2:34:27 PM
Last modification on : Friday, March 27, 2020 - 4:12:03 PM
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Monday, March 2, 2020 - 2:34:27 PM
Last modification on : Friday, March 27, 2020 - 4:12:03 PM
Identifiers
- HAL Id : hal-02495727, version 1
Citation
Mathieu Juan, Jean-Sébastien Bouillard, Jerome Plain, Gilles Lerondel, Renaud Bachelot, et al.. Quantum confinement tuning in porous silicon by local photo oxidation. NFO9, Sep 2006, Lausanne, Switzerland. ⟨hal-02495727⟩
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