Plasmon-based writing and manipulation in photopolymers: a new approach of high-resolution lithography - Archive ouverte HAL Access content directly
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Plasmon-based writing and manipulation in photopolymers: a new approach of high-resolution lithography

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hal-02487172 , version 1 (21-02-2020)

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  • HAL Id : hal-02487172 , version 1

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Renaud Bachelot. Plasmon-based writing and manipulation in photopolymers: a new approach of high-resolution lithography. Journée Scientifique WINFAB, Université Catholique de Louvin, Oct 2013, Louvin La Neuve, Belgique. ⟨hal-02487172⟩

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