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Plasmon-based writing and manipulation in photopolymers: a new approach of high-resolution lithography

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Conference papers
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https://hal-utt.archives-ouvertes.fr/hal-02487172
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Friday, February 21, 2020 - 2:07:28 PM
Last modification on : Saturday, February 22, 2020 - 1:39:19 AM

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  • HAL Id : hal-02487172, version 1

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Citation

Renaud Bachelot. Plasmon-based writing and manipulation in photopolymers: a new approach of high-resolution lithography. Journée Scientifique WINFAB, Université Catholique de Louvin, Oct 2013, Louvin La Neuve, Belgique. ⟨hal-02487172⟩

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