Plasmon-based writing and manipulation in photopolymers: a new approach of high-resolution lithography - Université de technologie de Troyes Access content directly
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Plasmon-based writing and manipulation in photopolymers: a new approach of high-resolution lithography

Renaud Bachelot
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Laboratoire de Nanotechnologie et d'Instrumentation Optique

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Optics / Photonic

Jean-Baptiste VU VAN  : Connect in order to contact the contributor

https://hal-utt.archives-ouvertes.fr/hal-02487172

Submitted on : Friday, February 21, 2020-2:07:28 PM

Last modification on : Friday, March 24, 2023-2:53:15 PM

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hal-02487172 , version 1 (21-02-2020)

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  • HAL Id : hal-02487172 , version 1

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Renaud Bachelot. Plasmon-based writing and manipulation in photopolymers: a new approach of high-resolution lithography. Journée Scientifique WINFAB, Université Catholique de Louvin, Oct 2013, Louvin La Neuve, Belgique. ⟨hal-02487172⟩

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