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Oxides films deposited by DC magnetron reactive sputtering

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https://hal-utt.archives-ouvertes.fr/hal-02486055
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Thursday, February 20, 2020 - 4:03:47 PM
Last modification on : Thursday, February 20, 2020 - 4:03:47 PM

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  • HAL Id : hal-02486055, version 1

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Lamia Radjehi, Linda Aissani, M.S. Bouamerene, Mamoun Fellah. Oxides films deposited by DC magnetron reactive sputtering. 2nd international workshop on magnetic materials and nanomaterials, Oct 2018, Boumerdès, Algeria. ⟨hal-02486055⟩

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