Skip to Main content Skip to Navigation
Journal articles

Surface Topography and Optical Properties of Thin AlN Films Produced on GaAs (100) Substrate by Reactive Ion-Plasma Sputtering

Abstract : A study of the surface topography and optical characteristics of thin AlN films used as passivating and antireflection coatings deposited on n-GaAs (100) substrates by reactive ion-plasma sputtering is reported. It was found that the process conditions affect the structure and the optical characteristics of the films, which makes it possible to obtain coatings with prescribed parameters. An analysis of the results furnished by ellipsometry and atomic-force microscopy of the surface shows that the refractive index of the films is correlated with the surface structure.
Complete list of metadatas

https://hal-utt.archives-ouvertes.fr/hal-02462150
Contributor : Daniel Gavrysiak <>
Submitted on : Friday, January 31, 2020 - 10:24:44 AM
Last modification on : Tuesday, July 14, 2020 - 11:04:09 AM

Identifiers

Collections

P2MN | UTT | CNRS

Citation

E. Fomin, A. Bondarev, Anna Rumyantseva, Thomas Maurer, N. Pikhtin, et al.. Surface Topography and Optical Properties of Thin AlN Films Produced on GaAs (100) Substrate by Reactive Ion-Plasma Sputtering. Pis'ma v Zhurnal Tekhnicheskoi Fiziki / Technical Physics Letters, MAIK Nauka/Interperiodica (МАИК Наука/Интерпериодика), 2019, 45 (3), pp.221-224. ⟨10.1134/S1063785019030076⟩. ⟨hal-02462150⟩

Share

Metrics

Record views

41