Study of the uniformity of 300mm wafer through ring- resonator analysis

C. Chauveau (1) , P. Labeye (1) , J.-M. Fedeli (1) , Sylvain Blaize (2) , Gilles Lerondel (2)

1 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
2 LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique

The uniformity of a 300mm wafer has been analyzed through the study of resonant wavelength of ring resonators. SOI thickness variation can be compensated with the use of Ti-TiN heater.

Keywords: Optical ring resonators; Optical waveguides; Heating; Optical device fabrication; Optical filters; Optical refraction; Optical variables control

Domains: Engineering Sciences [physics]; Optics / Photonic

C. Chauveau, P. Labeye, J.-M. Fedeli, Sylvain Blaize, Gilles Lerondel. Study of the uniformity of 300mm wafer through ring- resonator analysis. International Conference on Photonics in Switching (PS), Sep 2012, Ajaccio, France. ⟨hal-02453137⟩