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Study of the uniformity of 300mm wafer through ring- resonator analysis

C. Chauveau 1 P. Labeye 1 J.-M. Fedeli 1 Sylvain Blaize 2 Gilles Lerondel 2
1 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
2 LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique
ICD - Institut Charles Delaunay
Abstract : The uniformity of a 300mm wafer has been analyzed through the study of resonant wavelength of ring resonators. SOI thickness variation can be compensated with the use of Ti-TiN heater.
Keywords : Optical filters Optical refraction Optical variables control Optical device fabrication Heating Optical waveguides Optical ring resonators
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Conference papers
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https://hal-utt.archives-ouvertes.fr/hal-02453137
Contributor : Daniel Gavrysiak <>
Submitted on : Thursday, January 23, 2020 - 4:26:27 PM
Last modification on : Thursday, June 11, 2020 - 5:04:09 PM

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  • HAL Id : hal-02453137, version 1

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C. Chauveau, P. Labeye, J.-M. Fedeli, Sylvain Blaize, Gilles Lerondel. Study of the uniformity of 300mm wafer through ring- resonator analysis. International Conference on Photonics in Switching (PS), Sep 2012, Ajaccio, France. ⟨hal-02453137⟩

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