Optimal design of plasmonic nanostructures for plasmon-interference assisted lithography - Archive ouverte HAL Access content directly
Journal Articles Applied Physics B - Laser and Optics Year : 2008

Optimal design of plasmonic nanostructures for plasmon-interference assisted lithography

(1) , (1)
1

Abstract

We investigate the problem of synthesizing plasmonic nanostructures through the application of a bio-inspired stochastic optimization technique. We show, through some numerical experiments, that the approach proposed could serve as a starting point for the optimal fabrication and characterization of nanometric structures with defined scattering properties. Furthermore, we discuss its possibilities and potential applications.

Dates and versions

hal-02439770 , version 1 (14-01-2020)

Identifiers

Cite

Demetrio Macías, Alexandre Vial. Optimal design of plasmonic nanostructures for plasmon-interference assisted lithography. Applied Physics B - Laser and Optics, 2008, 93 (1), pp.159-163. ⟨10.1007/s00340-008-3194-0⟩. ⟨hal-02439770⟩

Collections

CNRS UTT
7 View
0 Download

Altmetric

Share

Gmail Facebook Twitter LinkedIn More