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Highly efficient interfacing of silicon-on-insulator and localized surface plasmon waveguides

Mickaël Février 1 Philippe Gogol 1 Abdelhanin Aassime 1 Robert Megy 1 Alexandre Bondi 1 Alexei Chelnokov 2, 3, 4 Aniello Apuzzo 5 Sylvain Blaize 5 Gilles Lérondel 5 Jean-Michel Lourtioz 1 Beatrice Dagens 1
1 IEF - Institut d'électronique fondamentale
2 DOPT - Département d'Optronique
3 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
4 MINATEC, CNRS, LTM
5 LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique
ICD - Institut Charles Delaunay
Abstract : Plasmonics implementation in optical circuits and interconnects requires interfacing with dielectric optical waveguides. We show here metallic nanoparticles chain mode excitation from SOI waveguide with a record distance lower than 600 nm at telecom wavelength.
Keywords : integrated optics integrated optoelectronics nanophotonics optical interconnections plasmonics silicon-on-insulator surface plasmons SOI waveguide metallic nanoparticles chain mode excitation dielectric optical waveguides optical interconnects optical circuits localized surface plasmon waveguides Si Optical waveguides Plasmons Nanoparticles Optical surface waves Couplings Surface waves
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https://hal-utt.archives-ouvertes.fr/hal-02360186
Contributor : Daniel Gavrysiak Connect in order to contact the contributor
Submitted on : Tuesday, November 12, 2019 - 4:49:39 PM
Last modification on : Wednesday, September 15, 2021 - 3:04:10 PM

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  • HAL Id : hal-02360186, version 1

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Mickaël Février, Philippe Gogol, Abdelhanin Aassime, Robert Megy, Alexandre Bondi, et al.. Highly efficient interfacing of silicon-on-insulator and localized surface plasmon waveguides. OFC/NFOEC, Mar 2012, Los Angeles, United States. ⟨hal-02360186⟩

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