Properties of chromium thin films deposited in a hollow cathode magnetron powered by pulsed DC or HiPIMS

Alexis de Monteynard; Frédéric Schuster; Alain Billard; Frédéric Sanchette

doi:10.1016/j.surfcoat.2017.10.006

Journal Articles Surface and Coatings Technology Year : 2017

Properties of chromium thin films deposited in a hollow cathode magnetron powered by pulsed DC or HiPIMS

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2
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Alexis de Monteynard

Function : Author

Laboratoire des Systèmes Mécaniques et d'Ingénierie Simultanée

Frédéric Schuster

Function : Author

Commissariat à l'Energie Atomique

Alain Billard

Function : Author
PersonId : 760498
ORCID : 0000-0003-2232-0868
IdRef : 075172623

Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174)

Frédéric Sanchette

Function : Author
PersonId : 784396
ORCID : 0000-0002-4665-1891
IdRef : 177130067

Laboratoire des Systèmes Mécaniques et d'Ingénierie Simultanée

Domains

Mechanics of materials [physics.class-ph]

Jean-Baptiste VU VAN : Connect in order to contact the contributor

https://hal-utt.archives-ouvertes.fr/hal-02281580

Submitted on : Monday, September 9, 2019-12:28:36 PM

Last modification on : Thursday, April 13, 2023-9:26:12 AM

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hal-02281580 , version 1 (09-09-2019)

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HAL Id : hal-02281580 , version 1
DOI : 10.1016/j.surfcoat.2017.10.006

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Alexis de Monteynard, Frédéric Schuster, Alain Billard, Frédéric Sanchette. Properties of chromium thin films deposited in a hollow cathode magnetron powered by pulsed DC or HiPIMS. Surface and Coatings Technology, 2017, 330, pp.241-248. ⟨10.1016/j.surfcoat.2017.10.006⟩. ⟨hal-02281580⟩

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Properties of chromium thin films deposited in a hollow cathode magnetron powered by pulsed DC or HiPIMS

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