p-type cuprous oxide thin films with high conductivity deposited by high power impulse magnetron sputtering

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https://hal-utt.archives-ouvertes.fr/hal-02281458
Contributor : Jean-Baptiste Vu Van <>
Submitted on : Monday, September 9, 2019 - 11:27:36 AM
Last modification on : Monday, September 16, 2019 - 4:36:06 PM

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Hui Sun, Sheng-Chi Chen, Chao-Kuang Wen, Tung-Han Chuang, Mohammad Arab Pour Yazdi, et al.. p-type cuprous oxide thin films with high conductivity deposited by high power impulse magnetron sputtering. Ceramics International, Elsevier, 2017, 43 (8), pp.6214-6220. ⟨10.1016/j.ceramint.2017.02.019⟩. ⟨hal-02281458⟩

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